| Autor: |
Shao-Min Wang, Qian Zhang, Yi-Tao Li, Si-Chao Liu, Qing-Yuan Yang |
| Jazyk: |
angličtina |
| Rok vydání: |
2024 |
| Předmět: |
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| Zdroj: |
Chem & Bio Engineering, Vol 1, Iss 6, Pp 535-540 (2024) |
| Druh dokumentu: |
article |
| ISSN: |
2836-967X |
| DOI: |
10.1021/cbe.3c00096 |
| Popis: |
Using solid adsorbents for the destructive sorption of nitrogen trifluoride (NF3) presents a potential solution to its dual challenges as a potent greenhouse gas and hazardous compound in microelectronics. In this study, a series of MOFs (M-MOF-74, M = Mg, Co, Ni, Zn) with open metal sites (OMSs) are utilized for NF3 adsorption. By employing single-component adsorption isotherms and the ideal adsorbed solution theory (IAST) selectivity calculations, the adsorption performance of various adsorbents is evaluated. The results indicate that Mg, Co, and Ni-MOF-74 exhibit high adsorption capacities for NF3, while Zn-MOF-74 shows a lower adsorption capacity, likely due to the weaker Lewis acidity of Zn2+. Experimental findings from PXRD and gas adsorption studies indicate structural pore alteration in the MOF-74 series following NF3 gas adsorption. Theoretical computational analyses reveal that the MOF-74 series has a higher adsorption affinity for NF3 compared to N2. This research provides insights into the use of efficient MOF sorbents for the destructive adsorption of NF3. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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