Gate-tunable hysteresis response of field effect transistor based on sulfurized Mo

Autor: S. Mathew, J. Reiprich, S. Narasimha, S. Abedin, V. Kurtash, S. Thiele, T. Scheler, B. Hähnlein, P. Schaaf, H. O. Jacobs, J. Pezoldt
Jazyk: angličtina
Rok vydání: 2023
Předmět:
Zdroj: AIP Advances, Vol 13, Iss 9, Pp 095224-095224-7 (2023)
Druh dokumentu: article
ISSN: 2158-3226
DOI: 10.1063/5.0165868
Popis: Hysteresis effects and their tuning with electric fields and light were studied in thin film molybdenum disulfide transistors fabricated from sulfurized molybdenum films. The influence of the back-gate voltage bias, voltage sweep range, illumination, and AlOx encapsulation on the hysteresis effect of the back-gated field effect transistors was studied and quantified. This study revealed the distinctive contribution of MoS2 surface, MoS2/SiO2 interface defects and their associated traps as primary sources of of hysteresis.
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