| Autor: |
Sangeetha Hari, Thomas Verduin, Pieter Kruit, Cornelis W. Hagen |
| Jazyk: |
angličtina |
| Rok vydání: |
2019 |
| Předmět: |
|
| Zdroj: |
Micro and Nano Engineering, Vol 4, Iss , Pp 1-6 (2019) |
| Druh dokumentu: |
article |
| ISSN: |
2590-0072 |
| DOI: |
10.1016/j.mne.2019.04.003 |
| Popis: |
The potential of Electron Beam Induced Deposition (EBID) to become a reliable and reproducible direct-write nanopatterning technique has been investigated. A key requirement is that patterns of sub-20 nm dimension can be reproducibly fabricated and measured. EBID was used for the controlled fabrication of sub-20 nm dense lines on bulk silicon. To study the reproducibility of the fabrication process, a method for the quantitative measurement of line widths was developed. The line width of sub-20 nm EBID lines has been determined to be reproducible to within 1 nm. The parameters of importance and the challenges in achieving reproducibility, for performing EBID in standard SEM's, are discussed. Keywords: Electron beam induced deposition, EBID, Reproducibility, Nano-lithography, Scanning electron microscope |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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