Gate-tunable metafilm absorber based on indium silicon oxide

Autor: Zhao Hongwei, Zhang Ran, Chorsi Hamid T., Britton Wesley A., Chen Yuyao, Iyer Prasad P., Schuller Jon A., Negro Luca Dal, Klamkin Jonathan
Jazyk: angličtina
Rok vydání: 2019
Předmět:
Zdroj: Nanophotonics, Vol 8, Iss 10, Pp 1803-1810 (2019)
Druh dokumentu: article
ISSN: 2192-8606
2192-8614
2019-0190
DOI: 10.1515/nanoph-2019-0190
Popis: In this work, reconfigurable metafilm absorbers based on indium silicon oxide (ISO) were investigated. The metafilm absorbers consist of nanoscale metallic resonator arrays on metal-insulator-metal (MIM) multilayer structures. The ISO was used as an active tunable layer embedded in the MIM cavities. The tunable metafilm absorbers with ISO were then fabricated and characterized. A maximum change in the reflectance of 57% and up to 620 nm shift in the resonance wavelength were measured.
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