Electronic transport properties of a-Si:H

Autor: Haili Li, Mitsuhiro Matsumoto
Jazyk: angličtina
Rok vydání: 2022
Předmět:
Zdroj: AIP Advances, Vol 12, Iss 3, Pp 035309-035309-9 (2022)
Druh dokumentu: article
ISSN: 2158-3226
DOI: 10.1063/5.0079701
Popis: To investigate the electron transport properties of hydrogenated amorphous silicon (a-Si:H), a series of quantum simulations and electron transport analyses were performed. The target system is a nano-scale junction of a-Si:H with various hydrogen concentrations sandwiched between two metal electrodes. The density functional based tight binding simulation was conducted to obtain the electronic structure, and the non-equilibrium Green’s function method was adopted to evaluate the electron transmission coefficient and the electric current under a bias field. It is confirmed that the hydrogen atoms passivate a part of defects in amorphous silicon, but the remaining defects realize the energy states in the bandgap; the p orbitals of silicon atoms mainly contribute to the electron transmission. The transport behavior is greatly affected by the hydrogen concentration. The interface between a-Si:H and the metal electrodes also influences the transport behavior through changing the spatial charge density inside the a-Si:H.
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