Structure and surface composition of NiCr sputtered thin films

Autor: Petrović S., Bundaleski N., Radović M., Ristić Z., Gligorić G., Peruško D., Zec S.
Jazyk: angličtina
Rok vydání: 2006
Předmět:
Zdroj: Science of Sintering, Vol 38, Iss 2, Pp 155-160 (2006)
Druh dokumentu: article
ISSN: 0350-820X
DOI: 10.2298/SOS0602155P
Popis: Thin films of nichrome were deposited by d.c. sputtering of a target (80%Ni 20%Cr w.t) by Ar+ions at a working pressure of 10-1 Pa and at room temperature. The phase composition and grain size were studied by X-ray Diffraction (XRD), while the surface chemical composition was determined by Low Energy Ion Scattering (LEIS). Analysis of phase composition showed that the NiCr thin films were a solid solution of chromium in a nickel matrix with increased nickel lattice parameters. LEIS analysis showed the presence of Ni Cr and O in the first atomic layer. There is a strong suspicion that surface passivation occurred by forming Cr2O3 oxide at the surface.
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