Fine-Structure Analysis of Perhydropolysilazane-Derived Nano Layers in Deep-Buried Condition Using Polarized Neutron Reflectometry

Autor: Kazuhiro Akutsu-Suyama, Hiroshi Kira, Noboru Miyata, Takayasu Hanashima, Tsukasa Miyazaki, Satoshi Kasai, Dai Yamazaki, Kazuhiko Soyama, Hiroyuki Aoki
Jazyk: angličtina
Rok vydání: 2020
Předmět:
Zdroj: Polymers, Vol 12, Iss 10, p 2180 (2020)
Druh dokumentu: article
ISSN: 12102180
2073-4360
DOI: 10.3390/polym12102180
Popis: A large background scattering originating from the sample matrix is a major obstacle for fine-structure analysis of a nanometric layer buried in a bulk material. As polarization analysis can decrease undesired scattering in a neutron reflectivity (NR) profile, we performed NR experiments with polarization analysis on a polypropylene (PP)/perhydropolysilazane-derived SiO2 (PDS)/Si substrate sample, having a deep-buried layer of SiO2 to elucidate the fine structure of the nano-PDS layer. This method offers unique possibilities for increasing the amplitude of the Kiessig fringes in the higher scattering vector (Qz) region of the NR profiles in the sample by decreasing the undesired background scattering. Fitting and Fourier transform analysis results of the NR data indicated that the synthesized PDS layer remained between the PP plate and Si substrate with a thickness of approximately 109 Å. Furthermore, the scattering length density of the PDS layer, obtained from the background subtracted data appeared to be more accurate than that obtained from the raw data. Although the density of the PDS layer was lower than that of natural SiO2, the PDS thin layer had adequate mechanical strength to maintain a uniform PDS layer in the depth-direction under the deep-buried condition.
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