| Autor: |
Andrew T. Binder, Jeffrey Steinfeldt, Kevin J. Reilly, Richard S. Floyd, Peter T. Dickens, Joseph P. Klesko, Andrew A. Allerman, Robert J. Kaplar |
| Jazyk: |
angličtina |
| Rok vydání: |
2024 |
| Předmět: |
|
| Zdroj: |
Applied Physics Express, Vol 17, Iss 10, p 101003 (2024) |
| Druh dokumentu: |
article |
| ISSN: |
1882-0786 |
| DOI: |
10.35848/1882-0786/ad85c1 |
| Popis: |
This work reports on high current density 1.2 kV class HfO _2 -gated vertical GaN trench metal-oxide-semiconductor field-effect transistors (MOSFETs). An output current density of 330 mA mm ^−1 is reported at a drain bias of five volts, which, to our knowledge, is over ten-times the highest reported values for 1.2 kV class GaN or SiC MOSFETs. This work also showcases a significant achievement in demonstrating substantially thick (100 nm) HfO _2 on GaN with simultaneous low leakage current (0.5 nA at 2 MV cm ^−1 ), a high breakdown strength (5.2 MV cm ^−1 ), and a high recorded dielectric constant (22.0). |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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