Analysis of the Dispersion of Electrical Parameters and Characteristics of FinFET Devices

Autor:	Arkadiusz Malinowski, Daniel Tomaszewski, Lidia Łukasiak, Andrzej Jakubowski, Makoto Sekine, Masaru Hori, Michael L. Korwin-Pawlowski
Jazyk:	angličtina
Rok vydání:	2023
Předmět:	FinFET line edge roughness parameter variability plasma etching technology computer aided design (TCAD) Telecommunication TK5101-6720 Information technology T58.5-58.64
Zdroj:	Journal of Telecommunications and Information Technology, Iss 4 (2023)
Druh dokumentu:	article
ISSN:	1509-4553 1899-8852
DOI:	10.26636/jtit.2009.4.960
Popis:	Extensive numerical simulations of FinFET structures have been carried out using commercial TCAD tools. A series of plasma etching steps has been simulated for different process conditions in order to evaluate the influence of plasma pressure, composition and powering on the FinFET topography. Next, the most important geometric parameters of the FinFETs have been varied and the electrical characteristics have been calculated in order to evaluate the sensitivity of the FinFET electrical parameters on possible FinFET structure variability.
Databáze:	Directory of Open Access Journals
Externí odkaz:	https://doaj.org/article/a64ad760157b48659e470b85e4c94391 Zobrazit plný text záznamu View record in DOAJ