Polishing Sapphire Substrates by 355 nm Ultraviolet Laser

Autor: X. Wei, X. Z. Xie, W. Hu, J. F. Huang
Jazyk: angličtina
Rok vydání: 2012
Předmět:
Zdroj: International Journal of Optics, Vol 2012 (2012)
Druh dokumentu: article
ISSN: 1687-9384
1687-9392
DOI: 10.1155/2012/238367
Popis: This paper tries to investigate a novel polishing technology with high efficiency and nice surface quality for sapphire crystal that has high hardness, wear resistance, and chemical stability. A Q-switched 355 nm ultraviolet laser with nanosecond pulses was set up and used to polish sapphire substrate in different conditions in this paper. Surface roughness Ra of polished sapphire was measured with surface profiler, and the surface topography was observed with scanning electronic microscope. The effects of processing parameters as laser energy, pulse repetition rate, scanning speed, incident angle, scanning patterns, and initial surface conditions on surface roughness were analyzed.
Databáze: Directory of Open Access Journals
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