| Autor: |
X D Hong, H R Zheng, D Liang |
| Jazyk: |
angličtina |
| Rok vydání: |
2020 |
| Předmět: |
|
| Zdroj: |
Materials Research Express, Vol 7, Iss 11, p 115011 (2020) |
| Druh dokumentu: |
article |
| ISSN: |
2053-1591 |
| DOI: |
10.1088/2053-1591/abc9e0 |
| Popis: |
MXenes are an emerging family of 2D transition metal carbides and nitrides and have already shown potential in various applications. However, up to now, studies on the field emission application of MXenes are scarce. In this study, the field emitters based on the Ti _3 C _2 T _x (MXene) flakes were prepared by facile solution process and the effect of different plasmas (H _2 , Ar, O _2 ) on the field emission properties of Ti _3 C _2 T _x films was investigated. The plasma treated Ti _3 C _2 T _x films showed significantly better field emission properties than that of as-deposited Ti _3 C _2 T _x films. Compared to the Ar and O _2 plasma treated Ti _3 C _2 T _x films, the H _2 plasma treated Ti _3 C _2 T _x films displayed lower turn-on field (8.5 V/ μ m) and larger maximum current density (1222 μ A cm ^−2 ). The H _2 plasma treated Ti _3 C _2 T _x films also showed good emission stability. These results suggested the potential of the H _2 plasma treated Ti _3 C _2 T _x films as electron source of vacuum electronic devices. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
|
