| Autor: |
M. V. Nageswara Rao, Mamidipaka Hema, Ramakrishna Raghutu, Ramakrishna S. S. Nuvvula, Polamarasetty P. Kumar, Ilhami Colak, Baseem Khan |
| Jazyk: |
angličtina |
| Rok vydání: |
2023 |
| Předmět: |
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| Zdroj: |
Journal of Electrical and Computer Engineering, Vol 2023 (2023) |
| Druh dokumentu: |
article |
| ISSN: |
2090-0155 |
| DOI: |
10.1155/2023/7069746 |
| Popis: |
Stationary random-access memory (SRAM) undergoes an expansion stage, to repel advanced process variation and support ultra-low power operation. Memories occupy more than 80% of the surface in today’s microdevices, and this trend is expected to continue. Metal oxide semiconductor field effect transistor (MOSFET) face a set of difficulties, that results in higher leakage current (Ileakage) at lower strategy collisions. Fin field effect transistor (FinFET) is a highly effective substitute to complementary metal oxide semiconductor (CMOS) under the 45 nm variant due to advanced stability. Memory cells are significant in the large-scale computation system. SRAM is the most commonly used memory type; SRAMs are thought to utilize more than 60% of the chip area. The proposed SRAM cell is developed with FinFETs at 16 nm knot. Power, delay, power delay product (PDP), Ileakage, and stationary noise margin (SNM) are compared with traditional 6T SRAM cells. The designed cell decreases leakage power, current, and read access time. While comparing 6T SRAM and earlier low power SRAM cells, FinFET-based 10T SRAM provides significant SNM with reduced access time. The proposed 10T SRAM based on FinFET provides an 80.80% PDP reduction in write mode and a 50.65% PDP reduction in read mode compared to MOSEFET models. There is an improvement of 22.20% in terms of SNM and 25.53% in terms of Ileakage. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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