| Autor: |
José Renato Calvacanti de Queiroz, Diego Alexandre Duarte, Rodrigo Othávio de Assunção e Souza, Sara Fernanda Fissmer, Marcos Massi, Marco Antonio Bottino |
| Jazyk: |
angličtina |
| Rok vydání: |
2011 |
| Předmět: |
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| Zdroj: |
Materials Research, Vol 14, Iss 2, Pp 212-216 (2011) |
| Druh dokumentu: |
article |
| ISSN: |
1516-1439 |
| Popis: |
In this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O2 increased the bond strength to (32.8 ± 5.4) MPa. This value has not been achieved by traditional methods. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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