High-Resolution Laser Interference Ablation and Amorphization of Silicon

Autor: Andreas Blumenstein, Peter Simon, Jürgen Ihlemann
Jazyk: angličtina
Rok vydání: 2023
Předmět:
Zdroj: Nanomaterials, Vol 13, Iss 15, p 2240 (2023)
Druh dokumentu: article
ISSN: 2079-4991
DOI: 10.3390/nano13152240
Popis: The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setup. Depending on the laser fluence, single-pulse irradiation leads to amorphization, structure formation via lateral melt flow or the formation of voids via peculiar melt coalescence. Through multipulse irradiation, combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) are observed.
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