Influence of the Surface Roughness of a Silicon Disk Resonator on Its Q-Factor

Autor: Anastasia V. Yakuhina, Alexey S. Kadochkin, Dmitry V. Gorelov, Vyacheslav V. Svetukhin, Sergey S. Generalov, Vladimir V. Amelichev
Jazyk: angličtina
Rok vydání: 2021
Předmět:
Zdroj: Photonics, Vol 8, Iss 6, p 225 (2021)
Druh dokumentu: article
ISSN: 2304-6732
DOI: 10.3390/photonics8060225
Popis: This article presents a silicon disk resonator of the whispering-gallery-mode (WGM) type. The calculated Q-factor of the silicon WGM resonator was 107. Two methods of studying the surface roughness of a silicon WGM resonator with a nonlinear profile by means of Helios 650 scanning electron microscope and Bruker atomic force microscope (AFM) are presented. The results obtained by the two methods agreed well with each other. A comparison of the surface roughness values of WGM resonators manufactured using different technological approaches is presented. Based on the obtained data, a preliminary estimated Q-factor calculation of the resonators was performed, which was refined by numerical calculation using the finite-difference time-domain (FDTD) method. The effect of the surface roughness of the resonator on its Q-factor was found. Reducing the surface roughness of the resonator from 30 nm to 1–2 nm led to an increase in its Q-factor from 104 to 107.
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