Low-loss slot waveguides with silicon (111) surfaces realized using anisotropic wet etching

Autor: Kapil Debnath, Ali Z Khokhar, Stuart A Boden, Hideo Arimoto, Swe Zin Oo, Harold M H Chong, Graham Trevor Reed, Shinichi Saito
Jazyk: angličtina
Rok vydání: 2016
Předmět:
Zdroj: Frontiers in Materials, Vol 3 (2016)
Druh dokumentu: article
ISSN: 2296-8016
DOI: 10.3389/fmats.2016.00051
Popis: We demonstrate low-loss slot waveguides on silicon-on-insulator (SOI) platform. Waveguides oriented along the (11-2) direction on the Si (110) plane were first fabricated by a standard e-beam lithography and dry etching process. A TMAH based anisotropic wet etching technique was then used to remove any residual side wall roughness. Using this fabrication technique propagation loss as low as 3.7dB/cm was realized in silicon slot waveguide for wavelengths near 1550nm. We also realized low propagation loss of 1dB/cm for silicon strip waveguides.
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