Engineering high quality graphene superlattices via ion milled ultra-thin etching masks

Autor: David Barcons Ruiz, Hanan Herzig Sheinfux, Rebecca Hoffmann, Iacopo Torre, Hitesh Agarwal, Roshan Krishna Kumar, Lorenzo Vistoli, Takashi Taniguchi, Kenji Watanabe, Adrian Bachtold, Frank H. L. Koppens
Jazyk: angličtina
Rok vydání: 2022
Předmět:
Zdroj: Nature Communications, Vol 13, Iss 1, Pp 1-7 (2022)
Druh dokumentu: article
ISSN: 2041-1723
DOI: 10.1038/s41467-022-34734-3
Popis: Focused-ion beam (FIB) lithography enables high-resolution nanopatterning of 2D materials, but usually introduces significant damage. Here, the authors report a FIB-based fabrication technique to obtain high quality graphene superlattices with 18-nm pitch, which exhibit electronic transport properties similar to those of natural moiré systems.
Databáze: Directory of Open Access Journals