Mechanism of local electric oxidation on two-dimensional MoS2 for resistive memory application

Autor: Hui Dong, Junzheng Mu, Jinfeng Peng, Xuejun Zheng, Liang Chu
Jazyk: angličtina
Rok vydání: 2024
Předmět:
Zdroj: iScience, Vol 27, Iss 10, Pp 110819- (2024)
Druh dokumentu: article
ISSN: 2589-0042
DOI: 10.1016/j.isci.2024.110819
Popis: Summary: The manipulation and mechanism of two-dimensional (2D) transition metal dichalcogenides (TMDs) by external electric field are significant to the photoelectric properties. Herein, the 2D MoS2 nanosheets were oxidized to form MoS2-MoO3 local heterojunctions by an electric field, applied in multistable memristors for the proposal of NanoQR code. A modified thermal oxidation model was derived to reveal the mechanism of local electric oxidation on 2D MoS2. From current-voltage curves, the barrier height of the MoS2 device showed an increase of 0.39 eV due to local oxidation after applying voltage for 480 s. Based on density-functional theory, the increase of barrier height was calculated as 0.38 eV between MoS2-MoS2 and MoS2-MoO3 supercells. The 2D MoS2-MoO3 local heterojunctions were further applied as multistable memory storage at the nanoscale. The findings suggest a novel strategy for controlling local electric oxidation on 2D TMDs to manipulate the properties for the application of photoelectric memory nanodevices.
Databáze: Directory of Open Access Journals