Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering
| Autor: | Marcio Luiz Moretti, Julio Cesar Sagas, Abel Andre Candido Recco |
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| Jazyk: | angličtina |
| Rok vydání: | 2023 |
| Předmět: | |
| Zdroj: | Materials Research, Vol 26 (2023) |
| Druh dokumentu: | article |
| ISSN: | 1516-1439 1980-5373 |
| DOI: | 10.1590/1980-5373-mr-2022-0500 |
| Popis: | Thin films of titanium aluminum nitride (Ti(1-x)AlxN) were deposited on silicon, copper, and plasma nitrided AISI D2 tool steel substrates through reactive direct current grid-assisted magnetron sputtering. The depositions were performed in the metal and compound modes using nitrogen flow rates of (7.2 ± 0.1) sccm and (6.8 ± 0.2) sccm, respectively. The relations between the process parameters and the crystallographic orientation were investigated. Chemical and mechanical properties were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), and instrumented indentation technique (IIT). X-ray diffraction spectra and electron diffraction patterns revealed the presence of a Ti(1-x)AlxN phase with a face-centered cubic structure in both films. In metal mode, the coatings exhibited a preferential (111) plane orientation, changing to (200) in the compound mode. The change in preferential orientation was influenced by the reactive gas partial pressure. |
| Databáze: | Directory of Open Access Journals |
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