| Popis: |
Capacitively coupled plasma (CCP) discharges working at low pressure are widely used for the synthesis of thin films and the modification of the surface properties of materials. Due to their importance, considerable research was carried out over the years to understand their working mechanisms, and the physical properties of the CCP discharges were measured by many research groups, while simulations of their characteristics were often performed using both fluid and kinematic models. However, most of the simulation and characterization work found in the literature is focused on the discharge steady-state characteristics, since most of the applications rely on its properties, while less information is available on the early stages. In fact, the initial stages of CCP plasma discharges are of great importance to improve the understanding of their ignition process as well as to figure out the working mechanism of pulsed discharges, the use of which has increased in importance in recent years. In this work, a review of the results published in recent years concerning the physical mechanisms involved in the very first stages of low-pressure CCP discharges is presented, focusing on the first few microseconds of discharge time. |
