High Power Normally-OFF GaN/AlGaN HEMT with Regrown p Type GaN

Autor: Gwen Rolland, Christophe Rodriguez, Guillaume Gommé, Abderrahim Boucherif, Ahmed Chakroun, Meriem Bouchilaoun, Marie Clara Pepin, Faissal El Hamidi, Soundos Maher, Richard Arès, Tom MacElwee, Hassan Maher
Jazyk: angličtina
Rok vydání: 2021
Předmět:
Zdroj: Energies, Vol 14, Iss 19, p 6098 (2021)
Druh dokumentu: article
ISSN: 1996-1073
DOI: 10.3390/en14196098
Popis: In this paper is presented a Normally-OFF GaN HEMT (High Electron Mobility Transistor) device using p-doped GaN barrier layer regrown by CBE (Chemical Beam Epitaxy). The impact of the p doping on the device performance is investigated using TCAD simulator (Silvaco/Atlas). With 4E17 cm−3 p doping, a Vth of 1.5 V is achieved. Four terminal breakdowns of the fabricated device are investigated, and the origin of the device failure is identified.
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