Autor: |
Hana Krýsová, Michael Neumann-Spallart, Hana Tarábková, Pavel Janda, Ladislav Kavan, Josef Krýsa |
Jazyk: |
angličtina |
Rok vydání: |
2021 |
Předmět: |
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Zdroj: |
Beilstein Journal of Nanotechnology, Vol 12, Iss 1, Pp 24-34 (2021) |
Druh dokumentu: |
article |
ISSN: |
2190-4286 |
DOI: |
10.3762/bjnano.12.2 |
Popis: |
Al2O3 layers were deposited onto electrodes by atomic layer deposition. Solubility and electron-transport blocking were tested. Films deposited onto fluorine-doped tin oxide (FTO, F:SnO2/glass) substrates blocked electron transfer to redox couples (ferricyanide/ferrocyanide) in aqueous media. However, these films were rapidly dissolved in 1 M NaOH (≈100 nm/h). The dissolution was slower in 1 M H2SO4 (1 nm/h) but after 24 h the blocking behaviour was entirely lost. The optimal stability was reached at pH 7.2 where no changes were found up to 24 h and even after 168 h of exposure the changes in the blocking behaviour were still minimal. This behaviour was also observed for protection against direct reduction of FTO. |
Databáze: |
Directory of Open Access Journals |
Externí odkaz: |
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