Study of Exposure Uniformity of UV LED Exposure System for Wafer-Level Camera Lenses

Autor: Kuo-Tsai Wu, Sheng-Jye Hwang, Huei-Huang Lee
Jazyk: angličtina
Rok vydání: 2019
Předmět:
Zdroj: Applied Sciences, Vol 9, Iss 19, p 4110 (2019)
Druh dokumentu: article
ISSN: 2076-3417
DOI: 10.3390/app9194110
Popis: Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.
Databáze: Directory of Open Access Journals