Influence of Metallic Indium Concentration on the Properties of Indium Oxide Thin Films

Autor:	Kalkan N.
Jazyk:	angličtina
Rok vydání:	2016
Předmět:	thin film vapor deposition optical properties electrical properties 78.20.-e 73.61-r 73.40.rw Technology Chemical technology TP1-1185 Chemicals: Manufacture use etc. TP200-248
Zdroj:	High Temperature Materials and Processes, Vol 35, Iss 9, Pp 949-954 (2016)
Druh dokumentu:	article
ISSN:	0334-6455 2191-0324
DOI:	10.1515/htmp-2015-0055
Popis:	Current–voltage characteristics of indium-embedded indium oxide thin films (600–850 Å), with Ag electrodes approximately 1000 Å thick, prepared by reactive evaporation of pure metallic indium in partial air pressure have been studied for substrate temperatures between 50 and 125°C. The optical properties of these films have also been investigated as a function of metallic indium concentration and substrate temperature. I–V characteristics of all the samples are non-ohmic, independent of metallic indium concentration. The conductivity of the films increases but the optical transmission decreases with increasing metallic indium concentration. Metallic indium concentration was found to be an important parameter affecting the film properties. Furthermore, two possible conduction mechanisms are proposed.
Databáze:	Directory of Open Access Journals
Externí odkaz:	https://doaj.org/article/32d3d83a82c44178825688a5203f876c Zobrazit plný text záznamu View record in DOAJ