| Autor: |
Chien-Ping Wang, Burn Jeng Lin, Pin-Jiun Wu, Jiaw-Ren Shih, Yue-Der Chih, Jonathan Chang, Chrong Jung Lin, Ya-Chin King |
| Jazyk: |
angličtina |
| Rok vydání: |
2022 |
| Předmět: |
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| Zdroj: |
Nanoscale Research Letters, Vol 17, Iss 1, Pp 1-7 (2022) |
| Druh dokumentu: |
article |
| ISSN: |
1556-276X |
| DOI: |
10.1186/s11671-021-03645-5 |
| Popis: |
Abstract An on-wafer micro-detector for in situ EUV (wavelength of 13.5 nm) detection featuring FinFET CMOS compatibility, 1 T pixel and battery-less sensing is demonstrated. Moreover, the detection results can be written in the in-pixel storage node for days, enabling off-line and non-destructive reading. The high spatial resolution micro-detectors can be used to extract the actual parameters of the incident EUV on wafers, including light intensity, exposure time and energy, key to optimization of lithographic processes in 5 nm FinFET technology and beyond. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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