Evolution of defect formation during atomically precise desulfurization of monolayer MoS2

Autor: Jong-Young Lee, Jong Hun Kim, Yeonjoon Jung, June Chul Shin, Yangjin Lee, Kwanpyo Kim, Namwon Kim, Arend M. van der Zande, Jangyup Son, Gwan-Hyoung Lee
Jazyk: angličtina
Rok vydání: 2021
Předmět:
Zdroj: Communications Materials, Vol 2, Iss 1, Pp 1-10 (2021)
Druh dokumentu: article
ISSN: 2662-4443
DOI: 10.1038/s43246-021-00185-4
Popis: Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical properties are revealed.
Databáze: Directory of Open Access Journals