| Autor: |
Tao Wen, Bo Ni, Yuchu Liu, Wei Zhang, Zi-Hao Guo, Yi-Chien Lee, Rong-Ming Ho, Stephen Z.D. Cheng |
| Jazyk: |
angličtina |
| Rok vydání: |
2021 |
| Předmět: |
|
| Zdroj: |
Giant, Vol 8, Iss , Pp 100078- (2021) |
| Druh dokumentu: |
article |
| ISSN: |
2666-5425 |
| DOI: |
10.1016/j.giant.2021.100078 |
| Popis: |
Utilizing the controlled self-assembling of a giant surfactant, a bottom-up method for constructing line gratings with sub-10 nm resolution has been developed. Via a simple solvent vapor annealing procedure, the giant surfactant comprised of an oligomeric silsesquioxane (DPOSS) and polystyrene (PS) tail (i.e., DPOSS-PS) has been precisely self-assembled into perpendicularly oriented lamellae structures. A follow-up thermal annealing further significantly promotes the long-range ordering, giving rise to highly oriented and defect-free sub-10 nm line patterns (up to areas of several µm2). The solvent evaporation and thermal annealing process, together with the strong segregation strength (χN) of DPOSS-PS, play crucial roles in the self-orientation and width-reduction of the line patterns. This simple processing of the easy-accessed giant surfactants results in a facile and more economic approach for large-scale nano-sized line grating fabrication. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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