| Autor: |
Yibo Wang, Huishan Wang, Chengxin Jiang, Xipin Chen, Chen Chen, Ziqiang Kong, Haomin Wang |
| Jazyk: |
angličtina |
| Rok vydání: |
2023 |
| Předmět: |
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| Zdroj: |
Nano Express, Vol 4, Iss 1, p 012001 (2023) |
| Druh dokumentu: |
article |
| ISSN: |
2632-959X |
| DOI: |
10.1088/2632-959X/acbc91 |
| Popis: |
Graphene has received much attention in multiple fields due to its unique physical and electrical properties, especially in the microelectronic application. Nowadays, graphene can be catalytically produced on active substrates by chemical vapor deposition and then transferred to the target substrates. However, the widely used wet transfer technique often causes inevitable structural damage and surface contamination to the synthetic CVD graphene, thus hindering its application in high-performance devices. There have been numerous reviews on graphene growth and transfer techniques. Thus, this review is not intended to be comprehensive; instead, we focus on the advanced plasma treatment, which may play an important role in the quality improvement throughout the growth and transfer of graphene. Promising pathways for future applications are also provided. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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