Structure and optical properties of TiO2 thin films deposited by ALD method

Autor: Szindler Marek, Szindler Magdalena M., Boryło Paulina, Jung Tymoteusz
Jazyk: angličtina
Rok vydání: 2017
Předmět:
Zdroj: Open Physics, Vol 15, Iss 1, Pp 1067-1071 (2017)
Druh dokumentu: article
ISSN: 2391-5471
DOI: 10.1515/phys-2017-0137
Popis: This paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM). Obtained roughness parameters have been calculated with XEI Park Systems software. Qualitative studies of chemical composition were also performed using the energy dispersive spectrometer (EDS). The structure of titanium dioxide was investigated by X-ray crystallography. A variety of crystalline TiO2 was also confirmed by using the Raman spectrometer. The optical reflection spectra have been measured with UV-Vis spectrophotometry.
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