| Autor: |
Xue-Qing Liu, Yong-Lai Zhang, Qian-Kun Li, Jia-Xin Zheng, Yi-Ming Lu, Saulius Juodkazis, Qi-Dai Chen, Hong-Bo Sun |
| Jazyk: |
angličtina |
| Rok vydání: |
2022 |
| Předmět: |
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| Zdroj: |
PhotoniX, Vol 3, Iss 1, Pp 1-13 (2022) |
| Druh dokumentu: |
article |
| ISSN: |
2662-1991 |
| DOI: |
10.1186/s43074-022-00047-3 |
| Popis: |
Abstract Femtosecond laser machining of biomimetic micro/nanostructures with high aspect ratio (larger than 10) on ultrahard materials, such as sapphire, is a challenging task, because the uncontrollable surface damage usually results in poor surface structures, especially for deep scribing. Here, we report an inside-out femtosecond laser deep scribing technology in combination with etching process for fabricating bio-inspired micro/nanostructures with high-aspect-ratio on sapphire. To effectively avoid the uncontrollable damage at the solid/air interface, a sacrificial layer of silicon oxide was employed for surface protection. High-quality microstructures with an aspect ratio as high as 80:1 have been fabricated on sapphire surface. As a proof-of-concept application, we produced a moth-eye inspired antireflective window with sub-wavelength pyramid arrays on sapphire surface, by which broadband (3–5 μm) and high transmittance (98% at 4 μm, the best results reported so far) have been achieved. The sacrificial layer assisted inside-out femtosecond laser deep scribing technology is effective and universal, holding great promise for producing micro/nanostructured optical devices. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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