The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering

Autor:	Brus V. V., Kovaluk Z. D., Maryanchuk P. D., Orletsky I. G., Maystruk E. V.
Jazyk:	English<br />Russian
Rok vydání:	2010
Předmět:	titanium dioxide film magnetron sputtering Electrical engineering. Electronics. Nuclear engineering TK1-9971
Zdroj:	Tekhnologiya i Konstruirovanie v Elektronnoi Apparature, Iss 5-6, Pp 60-62 (2010)
Druh dokumentu:	article
ISSN:	2225-5818 07274963
Popis:	The article deals with research on volt-ampere characteristics of metal contacts (Al, Cr, In, Mo, Ti) on titanium dioxide thin films and influence of annealing in vacuum on their electric properties. Volt-ampere characteristics measurements were taken by three-probe method. There was established that indium contact on TiO2 thin films possessed sharply defined ohmic properties.
Databáze:	Directory of Open Access Journals
Externí odkaz:	https://doaj.org/article/1b958fff73c2420cbadc2ae072749633 Zobrazit plný text záznamu View record in DOAJ