| Autor: |
L. Zhao, W. H. Ng, A. P. Knights, D. V. Stevanovic, D. J. Mannion, A. Mehonic, A. J. Kenyon |
| Jazyk: |
angličtina |
| Rok vydání: |
2022 |
| Předmět: |
|
| Zdroj: |
Frontiers in Materials, Vol 9 (2022) |
| Druh dokumentu: |
article |
| ISSN: |
2296-8016 |
| DOI: |
10.3389/fmats.2022.813407 |
| Popis: |
We report that implanting argon ions into a film of uniform atomic layer deposition (ALD)-grown SiOx enables electroforming and switching within films that previously failed to electroform at voltages |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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