On-wafer wideband characterization: a powerful tool for improving the IC technologies

Autor: Dimitri Lederer, Jean-Pierre Raskin
Jazyk: angličtina
Rok vydání: 2023
Předmět:
Zdroj: Journal of Telecommunications and Information Technology, Iss 2 (2023)
Druh dokumentu: article
ISSN: 1509-4553
1899-8852
DOI: 10.26636/jtit.2007.2.811
Popis: In the present paper, the interest of wideband characterization for the development of integrated technologies is highlighted through several advanced devices, such as 120 nm partially depleted (PD) silicon-on-insulator (SOI) MOSFETs, 120 nm dynamic threshold (DT) voltage – SOI MOSFETs, 50 nm FinFETs as well as long-channel planar double gate (DG) MOSFETs.
Databáze: Directory of Open Access Journals