On-wafer wideband characterization: a powerful tool for improving the IC technologies
Autor: | Dimitri Lederer, Jean-Pierre Raskin |
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Jazyk: | angličtina |
Rok vydání: | 2023 |
Předmět: | |
Zdroj: | Journal of Telecommunications and Information Technology, Iss 2 (2023) |
Druh dokumentu: | article |
ISSN: | 1509-4553 1899-8852 |
DOI: | 10.26636/jtit.2007.2.811 |
Popis: | In the present paper, the interest of wideband characterization for the development of integrated technologies is highlighted through several advanced devices, such as 120 nm partially depleted (PD) silicon-on-insulator (SOI) MOSFETs, 120 nm dynamic threshold (DT) voltage – SOI MOSFETs, 50 nm FinFETs as well as long-channel planar double gate (DG) MOSFETs. |
Databáze: | Directory of Open Access Journals |
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