Autor: |
R. V. Medvedev, A. A. Zameshin, J. M. Sturm, A. E. Yakshin, F. Bijkerk |
Jazyk: |
angličtina |
Rok vydání: |
2020 |
Předmět: |
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Zdroj: |
AIP Advances, Vol 10, Iss 4, Pp 045305-045305-8 (2020) |
Druh dokumentu: |
article |
ISSN: |
2158-3226 |
DOI: |
10.1063/1.5143397 |
Popis: |
X-ray W/B multilayer mirrors with a period of 2.5 nm were deposited by dc magnetron sputtering and studied in comparison with W/Si multilayer systems of the same period. Transmission electron microscopy, grazing incidence X-Ray reflectivity, and x-ray photoelectron spectroscopy analysis revealed that the layer quality and interfaces of the W/B multilayers are not better than those of the W/Si multilayers. Strong intermixing between W and B is present, which leads to compound formation with little or no pure W left after the interaction: an optically unfavorable boride formation and an increased roughness result in a reduced reflectivity. The deposited W/B multilayer mirrors showed a reflectivity of 34.5% at 0.84 nm and angle of incidence 9.7°, compared to 40% obtained for W/Si multilayers. Ion polishing applied on the boron layers did not result in improvements of the reflectivity. |
Databáze: |
Directory of Open Access Journals |
Externí odkaz: |
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