Communication—Annealing Strategies for Spray Deposited Precursor Films of p-Type CuCr1-xMgxO2

Autor: M. Boshta, M. M. Gomaa, M. H. Sayed, H. Mohamed, A. Shengelaya, E. Chikoidze, Y. Dumont, M. Neumann-Spallart
Jazyk: angličtina
Rok vydání: 2024
Předmět:
Zdroj: ECS Advances, Vol 3, Iss 1, p 012001 (2024)
Druh dokumentu: article
ISSN: 2754-2734
DOI: 10.1149/2754-2734/ad1a74
Popis: Annealing of sprayed pure and Mg doped CuCrO _2 thin films by high intensity, short time light irradiation leads to a single delafossite phase at comparatively low temperatures compared with traditional furnace annealing. P-type crystalline undoped and Mg-doped CuCrO _2 films were obtained within few minutes by annealing with halogen lamp between 550 °C and 650 °C in Ar atmosphere. Transport properties of Mg-doped thin films were comparable to furnace annealed samples despite much shorter annealing time. The results demonstrate that post-annealing of chemically deposited samples using light irradiation is an effective and fast method for obtaining transparent conducting delafossite thin films.
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