Autor: |
Héloïse De Paz-Simon, Abraham Chemtob, Céline Croutxé-Barghorn, Séverinne Rigolet, Laure Michelin, Loïc Vidal, Bénédicte Lebeau |
Jazyk: |
angličtina |
Rok vydání: |
2014 |
Předmět: |
|
Zdroj: |
APL Materials, Vol 2, Iss 11, Pp 113306-113306-7 (2014) |
Druh dokumentu: |
article |
ISSN: |
2166-532X |
DOI: |
10.1063/1.4897353 |
Popis: |
In view of their technological impact in materials chemistry, a simplified and more efficient synthetic route to mesoporous films is highly sought. We report, herein, a smart UV-mediated approach coupling in a one-stage process sol-gel photopolymerization and photoinduced template decomposition/ablation to making mesoporous silica films. Performed at room temperature with a solvent-free solution of silicate precursor and amphiphilic poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) block copolymer, the synthesis relies on photoacid generation to induce the fast formation (≈10 min) of mesostructured silica/surfactant domains. Continuation of UV exposure for three additional hours enables subsequent and complete photodegradation of the polyether copolymer, resulting in ordered or disordered mesoporous silica film. One of the most attractive features is that the one-step procedure relies on a continuous illumination provided by the same conventional medium-pressure Hg-Xe arc lamp equipped with a 254 nm reflector to enhance the emission of energetic photons |
Databáze: |
Directory of Open Access Journals |
Externí odkaz: |
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