Abnormal Bias-Temperature Stress and Thermal Instability of $\beta$ -Ga2O3 Nanomembrane Field-Effect Transistor

Autor: Jiyeon Ma, Oukjae Lee, Geonwook Yoo
Jazyk: angličtina
Rok vydání: 2018
Předmět:
Zdroj: IEEE Journal of the Electron Devices Society, Vol 6, Pp 1124-1128 (2018)
Druh dokumentu: article
ISSN: 2168-6734
DOI: 10.1109/JEDS.2018.2868905
Popis: In this paper, we report on the electrical and thermal instability of β-Ga2O3 nanomembrane field-effect transistor with a bottom-gate configuration. The fabricated device exhibits high electrical performance of field-effect mobility of up to 60.9 cm2/V·s, on/off-current ratio of 109 and subthreshold slope of 210 mV/dec. However, we observe abnormal positive threshold voltage (VTH) shifts under negative bias-temperature stress at an elevated operating temperature of 80 °C as well as under temperature-dependent transfer characteristics up to 200 °C. This abnormal instability is significantly influenced by the surface depletion effect, and is discussed using energy band diagram. The opposite VTH shift was achieved by applying atomic-layer deposited Al2O3 passivation layer.
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