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In photoreactors, non-uniform light distribution leads to regions either with an overabundance of light or insufficient light irradiation. The integration of light-guiding elements such as waveguides into photocatalytic reactors has been an emerging approach to improve light delivery. However, traditional waveguides with constant surface properties experience an exponential decay in scattering light intensity under side irradiation. This reduces the light propagation length and hinders the scale-up potential. In this work, we derive the relationship between attenuation coefficients with etching time, determine the correlation between etching time and waveguide location for uniform scattering, and experimentally validate different light scattering profiles by engineering the surface roughness distribution of waveguides. We apply a dimensionless number, the coefficient of variation, to characterize the relative light distribution uniformity for gradient-etched, uniform-etched, and unmodified waveguides. Scattering light uniformity via gradient etching is more than 13 times higher than that for uniform-etching. In addition, the light distribution for gradient etching exhibits improved uniformity than other approaches, such as tip coating, physical carving, and engineered pillars. We then evaluate the effect of different light scattering profiles on photocatalytic activities in a photodegradation test for methylene blue, with non-etched, uniform-etched, and gradient-etched waveguides serving as internal light-guiding elements. Gradient-etched waveguides show ∼4 times improvement in photodegradation activity over uniform-etched designs and ∼8 times over non-etched configurations. This result underscores gradient etching for waveguides as a viable approach for precision light delivery to increase the light distribution uniformity, thus enhancing reaction rates for photocatalytic reactors. |
