| Popis: |
We investigate the effects of substrate bias on cathodic arc deposition of Cr coatings without external substrate heating at four different substrate bias levels, floating, −30, −50, and −70 V. After 10 min of deposition, the substrate temperature reaches 180, 210, 230, and 260 °C for floating potential, −30, −50, and −70 V, respectively. Time-of-flight energy elastic recoil detection analysis shows that all grown coatings are of high purity, with no coating containing more than 0.2 at.% of C and/or O. Increasing the substrate bias also reduces the number of macroparticles, steers the texture from preferred [110]- to [100]-orientation and induces a residual compressive stress of ∼450 MPa in the coatings. The hardness of the coatings remains at a constant 7.5 GPa irrespective of the substrate bias. The four-point probe resistivity of the grown coatings is 15–17 μΩcm regardless of substrate bias, close to the 12.9 μΩcm of bulk Cr. |
