Benefits of on-wafer calibration standards fabricated in membrane technology
| Autor: | M. Rohland, U. Arz, S. Büttgenbach |
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| Jazyk: | German<br />English |
| Rok vydání: | 2011 |
| Předmět: | |
| Zdroj: | Advances in Radio Science, Vol 9, Pp 19-26 (2011) |
| Druh dokumentu: | article |
| ISSN: | 1684-9965 1684-9973 |
| DOI: | 10.5194/ars-9-19-2011 |
| Popis: | In this work we compare on-wafer calibration standards fabricated in membrane technology with standards built in conventional thin-film technology. We perform this comparison by investigating the propagation of uncertainties in the geometry and material properties to the broadband electrical properties of the standards. For coplanar waveguides used as line standards the analysis based on Monte Carlo simulations demonstrates an up to tenfold reduction in uncertainty depending on the electromagnetic waveguide property we look at. |
| Databáze: | Directory of Open Access Journals |
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