Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current

Autor: Gem Shoute, Amir Afshar, Triratna Muneshwar, Kenneth Cadien, Douglas Barlage
Jazyk: angličtina
Rok vydání: 2016
Předmět:
Zdroj: Nature Communications, Vol 7, Iss 1, Pp 1-5 (2016)
Druh dokumentu: article
ISSN: 2041-1723
DOI: 10.1038/ncomms10632
Popis: Wide-bandgap, metal-oxide thin-film transistors are limited in their application by the lack of available p-type material. Here, the authors demonstrate a wide-bandgap metal-oxide n-type semiconductor that sustains a strong p-type inversion layer using a barrier dielectric with a high-dielectric constant.
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