| Autor: |
Marta Różycka, Agata Jasik, Paweł Kozłowski, Krzysztof Bracha, Jacek Ratajczak, Anna Wierzbicka-Miernik |
| Jazyk: |
angličtina |
| Rok vydání: |
2023 |
| Předmět: |
|
| Zdroj: |
Metrology and Measurement Systems, Vol vol. 30, Iss No 4, Pp 809-819 (2023) |
| Druh dokumentu: |
article |
| ISSN: |
2300-1941 |
| DOI: |
10.24425/mms.2023.147955 |
| Popis: |
The paper presents the effect of ICP-RIE etching time using one-component plasma on various parameters of an InAs/GaSb type II superlattice matrix. In the studies, two samples used at different BCl3 gas flow rates were compared and it was found that using a lower flow rate of 7 sccm results in obtaining a smoother sidewall morphology. Next, five periodic mesa-shaped structures were etched under identical conditions, but using a different time. The results indicated that the ICP-RIE method using a BCl3 flow rate of 7 sccm, ICP:RIE power ratio of 300W:270W allowed the ICP:RIE formation of a periodic mesa-shaped structure with smooth and perpendicular sidewalls. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
|
