Programmable activation of quantum emitters in high-purity silicon with focused carbon ion beams

Autor:	Hollenbach, M., Klingner, N., Mazarov, P., Pilz, W., Nadzeyka, A., Mayer, F., Abrosimov, N. V., Bischoff, L., Hlawacek, G., Helm, M., Astakhov, G. V.
Rok vydání:	2024
Předmět:	Quantum Physics Physics - Applied Physics
Druh dokumentu:	Working Paper
Popis:	Carbon implantation at the nanoscale is highly desired for the engineering of defect-based qubits in a variety of materials, including silicon, diamond, SiC and hBN. However, the lack of focused carbon ion beams does not allow for the full disclosure of their potential for application in quantum technologies. Here, we develop and use a carbon source for focused ion beams for the simultaneous creation of two types of quantum emitters in silicon, the W and G centers. Furthermore, we apply a multi-step implantation protocol for the programmable activation of the G centers with sub-100- nm resolution. This approach provides a route for significant enhancement of the creation yield of single G centers in carbon-free silicon wafers. Our experimental demonstration is an important step towards nanoscale engineering of telecom quantum emitters in silicon of high crystalline quality and isotope purity. Comment: 7 pages, 5 figures
Databáze:	arXiv
Externí odkaz:	http://arxiv.org/abs/2404.19592 Zobrazit plný text záznamu View this record from Arxiv