| Autor: |
Liu, Yue, He, Wen, Wu, Bingze, Xuan, Fengyuan, Fang, Yuqiang, Zhong, Zhengbo, Fu, Jierui, Wang, Jiapeng, Li, Zhipeng, Wang, Jinzhong, Yao, Mingguang, Huang, Fuqiang, Zhen, Liang, Li, Yang, Xu, Chengyan |
| Rok vydání: |
2024 |
| Předmět: |
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| Druh dokumentu: |
Working Paper |
| Popis: |
Second harmonic generation (SHG) in van der Waals (vdWs) materials has garnered significant attention due to its potential for integrated nonlinear optical and optoelectronic applications. Stacking faults in vdWs materials, a typical kind of planar defect, can introduce a new degree of freedom to modulate the crystal symmetry and resultant SHG response, however, the physical origin and tunability of stacking-fault-governed SHG in vdWs materials remain unclear. Here, taking the intrinsically centrosymmetric vdWs RhI3 as an example, we theoretically reveal the origin of stacking-fault-governed SHG response, where the SHG response comes from the energetically favorable AC- Cstacking fault of which the electrical transitions along the high symmetry paths Gamma-M and Gamma-K in the Brillion zone play the dominant role at 810 nm. Such stacking-fault-governed SHG response is further confirmed via structural characterizations and SHG measurements. Furthermore, by applying hydrostatic pressure on RhI3, the correlation between structural evolution and SHG response is revealed with SHG enhancement up to 6.9 times, where the decreased electronic transition energies and huger momentum matrix elements due to the stronger interlayer interactions upon compression magnify the SHG susceptibility. This study develops a promising foundation based on strategically designed stacking faults for pioneering new avenues in nonlinear nano-optics. |
| Databáze: |
arXiv |
| Externí odkaz: |
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