| Autor: |
Chen, Jinming, Liu, Zhaoxiang, Song, Lvbin, Sun, Chao, Wang, Guanhua, Cheng, Ya |
| Rok vydání: |
2023 |
| Předmět: |
|
| Druh dokumentu: |
Working Paper |
| Popis: |
Photolithography assisted chemo-mechanical etching (PLACE), a technique specifically developed for fabricating highquality large-scale photonic integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled fabrication of a series of building blocks of PICs ranging from high-quality (high-Q) microresonators and low-loss waveguides to electrooptically (EO) tunable lasers and waveguide amplifiers. Aiming at high-throughput manufacturing of the PIC devices and systems, we have developed an ultra-high-speed high-resolution laser lithography fabrication system employing a high repetition rate femtosecond laser and a high-speed polygon laser scanner, by which a lithography fabrication efficiency of 4.8 cm2/h has been achieved at a spatial resolution of 200 nm. We demonstrate wafer-scale fabrication of TFLN-based photonic structures, optical phase masks as well as color printing |
| Databáze: |
arXiv |
| Externí odkaz: |
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