High-speed processing of X-ray wavefront marking data with the Unified Modulated Pattern Analysis (UMPA) model
Autor: | De Marco, Fabio, Savatović, Sara, Smith, Ronan, Di Trapani, Vittorio, Margini, Marco, Lautizi, Ginevra, Thibault, Pierre |
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Rok vydání: | 2022 |
Předmět: | |
Druh dokumentu: | Working Paper |
DOI: | 10.1364/OE.474794 |
Popis: | Wavefront-marking X-ray imaging techniques use e.g., sandpaper or a grating to generate intensity fluctuations, and analyze their distortion by the sample in order to retrieve attenuation, phase-contrast, and dark-field information. Phase contrast yields an improved visibility of soft-tissue specimens, while dark-field reveals small-angle scatter from sub-resolution structures. Both have found many biomedical and engineering applications. The previously developed Unified Modulated Pattern Analysis (UMPA) model extracts these modalities from wavefront-marking data. We here present a new UMPA implementation, capable of rapidly processing large datasets and featuring capabilities to greatly extend the field of view. We also discuss possible artifacts and additional new features. Comment: 18 pages, 7 figures, submitted to Optics Express |
Databáze: | arXiv |
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