High-speed processing of X-ray wavefront marking data with the Unified Modulated Pattern Analysis (UMPA) model

Autor: De Marco, Fabio, Savatović, Sara, Smith, Ronan, Di Trapani, Vittorio, Margini, Marco, Lautizi, Ginevra, Thibault, Pierre
Rok vydání: 2022
Předmět:
Druh dokumentu: Working Paper
DOI: 10.1364/OE.474794
Popis: Wavefront-marking X-ray imaging techniques use e.g., sandpaper or a grating to generate intensity fluctuations, and analyze their distortion by the sample in order to retrieve attenuation, phase-contrast, and dark-field information. Phase contrast yields an improved visibility of soft-tissue specimens, while dark-field reveals small-angle scatter from sub-resolution structures. Both have found many biomedical and engineering applications. The previously developed Unified Modulated Pattern Analysis (UMPA) model extracts these modalities from wavefront-marking data. We here present a new UMPA implementation, capable of rapidly processing large datasets and featuring capabilities to greatly extend the field of view. We also discuss possible artifacts and additional new features.
Comment: 18 pages, 7 figures, submitted to Optics Express
Databáze: arXiv