Chlorine insertion and manipulation on the Si(100)-2x1-Cl surface in the regime of local supersaturation

Autor: Pavlova, T. V., Shevlyuga, V. M., Andryushechkin, B. V., Eltsov, K. N.
Rok vydání: 2020
Předmět:
Zdroj: Phys. Rev. B 101, 235410 (2020)
Druh dokumentu: Working Paper
DOI: 10.1103/PhysRevB.101.235410
Popis: We insert and manipulate a single chlorine atom in chlorine monolayer on a Si(100)-2x1 surface using a scanning tunneling microscope. Two objects were created - a Cl atom in a groove between two dimer rows, and bridge-bonded Cl on a silicon dimer. Changing the voltage polarity leads to conversion of the objects into each other. Anisotropic movement of the objects at 77 K is mediated by two different diffusion mechanisms: hopping and crowdion-like motion. Insertion of a Cl atom in a groove between two dimer rows leads to the formation of a dangling bond on a third-layer Si atom. At positive sample voltage bias, the first object is positively charged, while the second object can be neutral or negatively charged depending on silicon sample doping.
Databáze: arXiv