Diode-like Selective Enhancement of Carrier Transport through Metal-Semiconductor Interface Decorated by Monolayer Boron Nitride
| Autor: | Jaiswal, Hemendra Nath, Liu, Maomao, Shahi, Simran, Wei, Sichen, Lee, Jihea, Chakravarty, Anindita, Guo, Yutong, Wang, Ruiqiang, Lee, Jung Mu, Chang, Chaoran, Fu, Yu, Dixit, Ripudaman, Liu, Xiaochi, Yang, Cheng, Yao, Fei, Li, Huamin |
|---|---|
| Rok vydání: | 2020 |
| Předmět: | |
| Druh dokumentu: | Working Paper |
| DOI: | 10.1002/adma.202002716 |
| Popis: | Two-dimensional (2D) semiconductors are promising material candidates for next-generation nanoelectronics. However, there are fundamental challenges related to their metal-semiconductor (MS) contacts which limit the performance potential for practical device applications. In this work, we exploit 2D monolayer hexagonal boron nitride (h-BN) as an ultrathin decorating layer to form a metal-insulator-semiconductor (MIS) contact, and demonstrate a novel diode-like selective enhancement of the carrier transport through it. Compared to the conventional MS contact, the MIS contact dominated by both thermionic emission and quantum tunneling can significantly reduce the contact resistance and boost the electron transport from the semiconductor to the metal, but has negligible effects on the electron transport oppositely. We also investigate the negative barrier height with the concept of carrier collection barrier, and show its critical role at the drain end for determining the overall transistor performance. Comment: Currently under review |
| Databáze: | arXiv |
| Externí odkaz: |
|