| Autor: |
Karsthof, Robert, Anton, Arthur Markus, Kremer, Friedrich, Grundmann, Marius |
| Rok vydání: |
2020 |
| Předmět: |
|
| Zdroj: |
Phys. Rev. Materials 4, 034601 (2020) |
| Druh dokumentu: |
Working Paper |
| DOI: |
10.1103/PhysRevMaterials.4.034601 |
| Popis: |
This work reports on temperature-induced out-diffusion and concentration decay of the prominent intrinsic point defect VNi (nickel vacancy) in the wide-gap p-type semiconductor nickel oxide (NiO). VNi can easily be introduced into NiO thin films by offering high oxygen partial pressures during film growth, rendering nonstoichiometric semiconducting structures. However, exposure to lower oxygen supply after growth, e.g. in a standard atmosphere, usually leads to a gradual decrease of film conductivity, because the vacancy concentration equilibrates. In this study, we observe this process in situ by performing temperature-dependent measurements of the electrical conductivity on a room temperature-grown NiO film. At a temperature of 420K under exclusion of oxygen, the doping level decreases by a factor of 8 while the associated room temperature dc conductivity drops by six orders of magnitude. At the same time, out-diffusion of the mobile VNi species can be indirectly observed through the occurrence of electrode polarization characteristics. |
| Databáze: |
arXiv |
| Externí odkaz: |
|
