UV-laser modification and selective ion-beam etching of amorphous vanadium pentoxide thin films

Autor:	Cheremisin, Alexander, Putrolaynen, Vadim, Velichko, Andrei, Pergament, Alexander, Kuldin, Nikolay, Grishin, Alexander
Rok vydání:	2020
Předmět:	Physics - Applied Physics Condensed Matter - Materials Science
Zdroj:	Phys. Status Solidi A, 206, No. 7, 1484-1487, (2009)
Druh dokumentu:	Working Paper
DOI:	10.1002/pssa.200824175
Popis:	We present the results on excimer laser modification and patterning of amorphous vanadium pentoxide films. Wet positive resist-type and Ar ion-beam negative resist-type etching techniques were employed to develop UV-modified films. V2O5 films were found to possess sufficient resistivity compared to standard electronic materials thus to be promising masks for sub-micron lithog-raphy Comment: 4 pages, 2 figures
Databáze:	arXiv
Externí odkaz:	http://arxiv.org/abs/2001.03054 Zobrazit plný text záznamu View this record from Arxiv